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Scanning Probe Nanolithography In our group we are developing Scanning Probe Lithography (SPL) as one of the exploratory tools for nanolithography in ambient environment and in-situ metrology. SPL can perform oxidation, deposition, mechanical modification, and field emission polymerization at nano-scale. SPL can pattern features with critical size of 10-200nm. In future we will utilize SPL as a prototyping tool to explore molecular level devices. For instance, by applying voltage between conductive AFM tip and metal or semiconductor substrate, we can introduce clocal oxidation to the substrate material through the tunning current between the tip and substrate. With the highly confined field, we can write insulating lines which separate the conducting substrate film. The change in surface morphology due to oxidation growth can be monitored with the same probe. We have successfully patterned features with linewidth less than 40nm using anodic oxidation. The following two pictures show the nanostructures fabricated on Ti film
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