Prof. Xiang Zhang's Laboratory

at UC Berkeley

Site Updated:
09/18/2008

Electron Beam Lithography

We had established reliable e-Beam nanofabrication process to routinely fabrication nano-structures and nanodevices with critical dimension as small as 30 nm. By far, we have achieved 18nm minimal spacing with EBL process (Figure 1,2). In future we plan to study the effect of electron scattering to the optimal resolution on processable substrate materials.
In our group we employ EBL as a testbed for new designs of optical frequency metamaterials, plasmonic optics, nanophotonics (Figure 3) and bioNEMS sensors

Figure 1 A chain of nanoparticles with gap less than 18 nm

 

Figure 2 A metallic doublet

Figure 3 nano scale grating for nanophotonics

 

 
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